Glow Discharge Processes: Sputtering and Plasma Etching

Book details

Details for Glow Discharge Processes: Sputtering and Plasma Etching
AuthorChapman, Brian N.
PublisherWiley-Interscience
Bindinghardcover
PublishedSeptember 25, 1980
Edition1
LanguageEnglish
Pages406
ISBN-10047107828X
ISBN-139780471078289
Weight1.85 lb
Dimensions
H × W × L
1.3 in × 6.1 in × 9.5 in

Glow Discharge Processes: Sputtering and Plasma Etching

$51.47 $292.95
Availability:
In stock
SKU:
047107828X-5
Condition
Condition notes

Used book in acceptable condition. Pages and cover may have wear, tears, or stickers. Notes or highlighting are possible. CDs and access codes may be missing.

About this book

Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.


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